U poslednje vreme se izgleda ne meri ništa, to je samo naziv tehnologije, ranije se pod tim podrazumevala dimenzija najmanje strukture.
Early semiconductor processes had arbitrary names for generations (viz.,
HMOS I/II/III/IV and
CHMOS III/III-E/IV/V). Later each new generation process became known as a
technology node or
process node, designated by the process'
minimum feature size in
nanometers (or historically
micrometers) of the process's
transistor gate length, such as the "
90 nm process". However, this has not been the case since 1994, and the number of nanometers used to name process nodes (see the
International Technology Roadmap for Semiconductors) has become more of a marketing term that has no standardized relation with functional feature sizes or with transistor density (number of transistors per square millimeter).
I još malo, vezano za Intel:
Initially transistor gate length was smaller than that suggested by the process node name (e.g. 350 nm node); however this trend reversed in 2009. For example, Intel's former
10 nm process actually has features (the tips of
FinFET fins) with a width of 7 nm, so the Intel 10 nm process is similar in transistor density to TSMC's
7 nm process. GlobalFoundries' 12 and 14 nm processes have similar feature sizes.
I još: u najnovijem proizvodnom procesu se uglavnom prvo prave memorijski čipovi, jer su najjednostavnije strukture i najlakše je postići potreban procenat ispravnih komponenti - bar je ranije bilo tako.
